Light Controlled Vapor Deposition
This patented technology demonstrates light-controlled deposition of potassium atoms onto a glass substrate by Light-Induced Drift. Vapor deposition is used in a wide variety of applications to deposit a film of material onto a surface. Unfortunately, most vapor deposition processes are characterized by high temperature operation or space charge build-up effects which can be damaging to the substrate. Light-Induced Drift (LID) addresses the need for a combination of deposition parameters that are necessary for certain applications.
Light controlled vapor deposition has features which address the problems associated with thermal CVD by offering significantly lower deposition temperatures. Problems encountered with plasma CVD are addressed by reducing the damage to substrates and layers caused by ion bombardment by virtue of controlling the bulk motion of atoms by externally applied light beams. LID has the physical effect of causing the atoms of selected species to drift through the gas mixture.
In addition to deposition applications, this technology can be used in semiconductor and flat panel display manufacture. Within the semiconductor market, the most valuable applications may be in control of ion etch and elimination of contaminants.
For more information please contact:
Girish Nallur, Ph.D.
Chief Scientific Officer
Competitive Technologies, Inc.
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Tel: 203.368.6044
